Plasma and Fusion Research
Volume 13, 3403085 (2018)
Regular Articles
- Monozukuri Department, Tokyo Metropolitan College of Industrial Technology, Higashi-Oi, Shinagawa, Tokyo 140-0011, Japan
- 1)
- Faculty of Science and Technology, Keio University, Hiyoshi, Kohoku-ku, Yokohama, Kanagawa 223-8522, Japan
Abstract
Effects of H− ion on distributions of electric potential and plasma density near the wall with the magnetic field decreasing toward the wall are investigated analytically. In the analysis, the magnetic field is assumed to be perpendicular to the wall, and the problem is treated as one-dimensional model. The plasma-sheath equation is derived analytically and the potential distribution near the wall is obtained by solving the plasma-sheath equation. The plasma density distributions are obtained from the potential distribution. It is shown that the effect of the production amount of H− ion on plasma density distributions is large. The effect of the magnetic field profile and the ion temperature on the distributions of electric potential and particle density are also shown.
Keywords
hydrogen negative ion, magnetic field, plasma-sheath equation, electric potential, plasma density
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