Plasma and Fusion Research

Volume 13, 3401044 (2018)

Regular Articles


Magnetic Field Configuration Dependence of Plasma Production and Parallel Transport in a Linear Plasma Device NUMBER
Daichi HAMADA, Atsushi OKAMOTO, Takaaki FUJITA, Hideki ARIMOTO, Katsuya SATOU and Ryosuke OCHIAI
Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
(Received 28 December 2017 / Accepted 14 March 2018 / Published 10 May 2018)

Abstract

In order to study a new method of generating energetic ion, a linear plasma device NUMBER was designed and constructed. The device consists of a plasma production region and a test region connected axially. The radial profile of the electron density and the electron temperature were measured using a Langmuir probe. The radius of plasma is consistent with a field line trace calculation. The time evolution of the ion saturation current Iis was measured. A high Iis phase accompanied by rapid increase and rapid decrease of Iis was observed. From the scan of magnetic field in the test region, it is found that the high Iis phase may be caused by unexpected electron cyclotron resonance in the test region. The gas pressure is also related to the appearance of the high Iis phase.


Keywords

energetic ion, linear plasma device, electron cyclotron resonance, overdense plasma, plasma production

DOI: 10.1585/pfr.13.3401044


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