Plasma and Fusion Research
Volume 9, 1401011 (2014)
Regular Articles
- Keio University, 3-14-1 Hiyosi, Yokohama, Kanagawa 223-8522, Japan
- 1)
- Japan Atomic Energy Agency, 801-1 Mukouyama, Naka, Ibaraki 311-0193, Japan
- 2)
- Shinshu University, 4-17-1 Wakasato, Nagano 380-8553, Japan
Abstract
Spatial profiles of the atomic (H0) density and the resultant Hα line intensity are investigated in a large negative ion source (the Japan Atomic Energy Agency (JAEA) 10 A negative ion source). The H0 density analysis has been done in the present study with the effects of production, transport, and ionization processes by taking into account the non-Maxwellian component of electron energy distribution function (EEDF). The H0 density profile shows a non-uniform spatial profile due to the local enhancement of the H0 production rate even with the flattening effects by the ionization and the transport processes. The Hα line intensity observed from the viewing ports in the spectrometry is compared with the line intensity in the calculation to validate the numerical results. The both results show a good agreement in the spatial profile. It has been shown that the non-Maxwellian component of the EEDF plays an important role to determine the profile of the Hα line intensity in the plasma production region.
Keywords
negative ion source, spatial non-uniformity of atomic density, numerical analysis, electron energy distribution function, atomic transport, Collisional-Radiative model
Full Text
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This paper may be cited as follows:
Takanori SHIBATA, Mieko KASHIWAGI, Akiyoshi HATAYAMA, Keiji SAWADA, Takashi INOUE and Masaya HANADA, Plasma Fusion Res. 9, 1401011 (2014).