[Table of Contents]

Plasma and Fusion Research

Volume 6, 2406045 (2011)

Regular Articles

Optical Emission Signatures of Dual Planar Magnetron Plasmas for TiO2 Deposition
Michelle Marie S. VILLAMAYOR, Takashi NAKAJIMA1), Henry J. RAMOS and Motoi WADA1)
Plasma Physics Laboratory, National Institute of Physics, College of Science, University of the Philippines - Diliman, Quezon City 1101, Philippines
1)
Applied Physics Laboratory, Department of Engineering Kyotanabe Campus, Doshisha University, Kyoto, Japan
(Received 6 December 2010 / Accepted 7 March 2011 / Published 12 July 2011)

Abstract

The dual planar magnetron (DPM) configuration features a mirror reactive magnetron sputtering system unlike that of a single planar unbalanced magnetron set-up. Optical emission signatures of a mixed species of oxygen and argon plasmas show a decrease in intensity peaks when only a single plane is biased. This manifests an oxide layer formation on the target for the single planar case thereby lowering the sputtering yield of the titanium target. No changes in emission intensity peaks are observed when the dual planes are biased. This is favorable for increasing the yield of sputtered titanium beneficial for raising the deposition rate of TiO2 thin film. The DPM process exhibits the anatase and rutile phases of the synthesized TiO2 films. The films are characterized by XRD, FE-SEM, reflectance and FTIR spectroscopy. Photo-reactive properties of the materials are also presented.

Keywords

magnetron sputtering, passivation, sputtering, thin film deposition, TiO2

DOI: 10.1585/pfr.6.2406045

Full Text

PDF format (1.2Mbytes) PDF Download

References

  • [1] X. Chen and S.S. Mao, Chem. Rev. 107, 2891 (2007).
  • [2] B. O'Regan and M. Grätzel, Nature 353, 737 (24 October 1991).
  • [3] C.J. Tavares, J. Viera et al., Materials Science and Engineering B 138, 139 (2007).
  • [4] A. Fujishima and K. Honda, Nature 238, 37 (1972).
  • [5] L. Mao, S. Tanemura et al., Journal of Crystal Growth 260, 118 (2004).
  • [6] S. Chaiyakun, A. Pokaipisit et al., Applied Physics A 95, 579 (2009).
  • [7] J. Zhao, X. Wang, R. Chen and L. Li, Solid State Communications 134, 705 (2005).
  • [8] H.K. Yu, T.H. Eun, G. Yi and S. Yang, Journal of Colloid and Interface Science 316, 175 (2007).
  • [9] K. Kalantar-zadeh et al., Thin Solid Films 518, 1180 (2009).
  • [10] F.S. de Vicente et al., Brazilian Journal of Physics 25, 24 (2006).
  • [11] S. Ulucan et al., Journal of Optoelectronics and Advanced Materials 7, 297 (2005).
  • [12] M. Mallak et al., Thin Solid Films 515, 8072 (2007).
  • [13] C.H. Heo et al., Thin Solid Films 475, 183 (2005).
  • [14] L. Chen et al., Thin Solid Films 515, 1176 (2006).
  • [15] J.T. Yates, Jr., Surface Science 603, 1605 (2009).

This paper may be cited as follows:

Michelle Marie S. VILLAMAYOR, Takashi NAKAJIMA, Henry J. RAMOS and Motoi WADA, Plasma Fusion Res. 6, 2406045 (2011).