Plasma and Fusion Research

Volume 6, 1306155 (2011)

Letters

Arrangement of PC12 Cells on a Silicon Chip via Extracellular Matrix (ECM) Layer Patterning by Atmospheric Pressure Plasmas

Ayumi ANDO, Hidetaka UNO¹⁾, Toshifumi ASANO²⁾, Tsuneo URISU¹⁾ and Satoshi HAMAGUCHI

: Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
1): FIRST Research Center for Innovative Nanobiodevice, Nagoya University, Furo-cho, Chikusa, Nagoya, Aichi 464-8603, Japan
2): Division of Neuroscience, Department of Developmental Biology and Neurosciences, Tohoku University, 2-1-1 Katahira, Aoba, Sendai, Miyagi 980-8577, Japan

(Received 28 September 2011 / Accepted 8 November 2011 / Published 28 December 2011)

Abstract

It is shown that neuronal model cells PC12 (rat adrenal pheochromocytoma cell line) can be cultured on a silicon (Si) substrate with the use of extracellular matrix (ECM) patterned by atmospheric-pressure plasmas (APPs). Arrangement of neuron cells in a desired pattern on a Si chip is an important step for the development of neuron cell chips. In the experiments, 100-200 µm wide strips of ECM (Poly-L-Lysine) layers arranged in parallel were formed on a 1 cm² area of a Si surface by the APP etching technique and PC12 cells were shown to grow on the ECM strips. The APP etching technique for ECM layers provides a simple mean of arranging neuron cells on a relatively large area of a Si surface.

Keywords

atmospheric pressure plasma, extracellular matrix, patterning, plasma etching, PC12 cell, cell adhesion

DOI: 10.1585/pfr.6.1306155

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References

[1] A. Bernard, J.P. Renault, B. Michel, H.R. Bosshard and E. Delamarche, Adv. Mater. 12, 1067 (2000).
[2] E. Delamarche, C. Donzel, F.S. Kamounah, H. Wolf, M. Geissler, R. Stutz, P.S. Winkel, B. Michel, H.J. Mathieu and K. Schaumburg, Langmuir 19, 8749 (2003).
[3] C.D. James, R.C. Davis, L. Kam, H.G. Craighead, M. Isaacson, J.N. Turner and W. Shain, Langmuir 14, 741 (1998).
[4] V.N. Morozov and T.Y. Morozova, Anal. Chem. 71, 3110 (1999).
[5] L. Pardo, W.C. Wilson, Jr. and T. Boland, Langmuir 19, 1462 (2003).
[6] A. Bernard, B. Michel and E. Delamarche, Anal. Chem. 73, 8 (2001).
[7] E. Delamarche, D. Juncker and H. Schmid, Adv. Mater. 17, 2911 (2005).
[8] A. Ando, M.A. Sayed, T. Asano, R. Tero, K. Kitano, T. Urisu and S. Hamaguchi, J. Phys.: Conf. Ser. 232, 012019 (2010).
[9] D. Thomas, S.D. Patterson and R.A. Bradshaw, J. Biol. Chem. 270, 28924 (1995).
[10] E. Silverman, M. Frödin, S. Gammeltoft and J.L. Maller, Mol. Cell. Biol. 24, 10573 (2004).
[11] J.A. Hillion, K. Takahashi, D. Maric, C. Ruetzler, J.L. Barker and J.M. Hallenbeck, J. Cereb. Blood Flow Metab. 25, 154 (2005).
[12] N. Ishikura, J.L. Clever, E.B. Bernstein, E. Samayoa, S.B. Prusiner, E.J. Huang and S.J. DeArmond, Proc. Natl. Acad. Sci. USA. 102, 886 (2005).
[13] H.M. Eckenrode and H.L. Dai, Langmuir 20, 9202 (2004).
[14] S. Ikawa, K. Kitano and S. Hamaguchi, Plasma Process. Polym. 7, 33 (2010).
[15] X.T. Deng, J.J. Shi and M.G. Kong, J. Appl. Phys. 101, 074701 (2007).
[16] Y. Sakiyama, N. Knake, D. Schröder, J. Winter, V.S. Gathen and D.B. Graves, Appl. Phys. Lett. 97, 151501 (2010).

This paper may be cited as follows:

Ayumi ANDO, Hidetaka UNO, Toshifumi ASANO, Tsuneo URISU and Satoshi HAMAGUCHI, Plasma Fusion Res. 6, 1306155 (2011).