Plasma and Fusion Research
Volume 5, S2106 (2010)
Regular Articles
- Department of Electronic Device Engineering, Yamaguchi University, Ube 755-8611, Japan
- 1)
- Ube National College of Technology, Ube 755-8555, Japan
Abstract
To develop a hydrogen pair-ion plasma source comprising only hydrogen atomic pair ions, i.e., H+ and H− ions, the efficient production of pair ions is required. When discharged hydrogen plasma is used to irradiate a Ni catalyst, pair ions are produced on the catalyst surface. Hydrogen chemisorption on the catalyst and the electronegativity of the catalyst material are found to affect pair-ion production.
Keywords
hydrogen pair ion, plasma irradiation, porous catalyst
Full Text
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This paper may be cited as follows:
Wataru OOHARA and Osamu FUKUMASA, Plasma Fusion Res. 5, S2106 (2010).