[Table of Contents]

Plasma and Fusion Research

Volume 4, 028 (2009)

Regular Articles


Liquid-Gas Interfacial Plasmas for the Formation of Novel Nanobiomaterials
Toshiro KANEKO1,2), Kazuhiko BABA1) and Rikizo HATAKEYAMA1)
1)
Department of Electronic Engineering, Tohoku University, Sendai 980-8579, Japan
2)
CREST/JST, Tokyo 102-0075, Japan
(Received 4 December 2008 / Accepted 3 April 2009 / Published 29 June 2009)

Abstract

The liquid-gas interfacial region, which is the boundary between plasmas and liquids, activates physical and chemical reactions, thus attracting much attention as a novel reactive field in nanobiomaterial creation. Owing to the unique properties of ionic liquids such as their extremely low vapor pressure and high heat capacity, we successfully created a reactive liquid-gas (ionic liquids-plasmas) interfacial field under a low gas pressure condition, in which the plasma ion behavior can be controlled. The effects of plasma ion irradiation on the liquid medium are for the first time revealed quantitatively. In connection with the plasma ion irradiation, the potential structure and optical emission properties of the liquid-gas interfacial plasma were investigated by changing the polarity of the electrode in the liquid to evaluate liquid-plasma interactions. These results may contribute to systematizing the field of liquid-gas interfacial plasma physics for certain applications. Furthermore, novel nanobiocomposite materials, such as DNA-encapsulated carbon nanotubes, were formed using liquid-phase plasma, and for the first time, modifications of the electrical properties of nanocarbons according to the types of encapsulated DNA were demonstrated.


Keywords

liquid-gas interfacial plasma, ionic liquid, ion irradiation, potential structure, nanobiomaterial

DOI: 10.1585/pfr.4.028


References

  • [1] J. Gubkin, Ann. Physik. 32, 114 (1887).
  • [2] A.R. Denaro and A. Hickling, J. Electrochem. Soc. 105, 265 (1958).
  • [3] Y. Kanzaki, M. Hirabe and O. Matsumoto, J. Electrochem. Soc. 133, 2267 (1986).
  • [4] T. Cserfalvi and P. Mezei, J. Anal. At. Spectrom. 9, 345 (1994).
  • [5] B.R. Locke, M. Sato, P. Sunka, M.R. Hoffmann and J.-S. Chang, Ind. Eng. Chem. Res. 45, 882 (2006).
  • [6] N. Sano, H. Wang, M. Chhowalla, I. Alexandrou and G.A.J. Amaratunga, Nature (London) 414, 506 (2001).
  • [7] I.V. Lisitsyn, H. Nomiyama, S. Katsuki and H. Akiyama, Rev. Sci. Instrum. 70, 3457 (1999).
  • [8] K. Imasaka, J. Suehiro, Y. Kanatake, Y. Kato and M. Hara, Nanotechnol. 17, 3421 (2006).
  • [9] J. Hieda, N. Saito and O. Takai, J. Vac. Sci. Technol. A 26, 854 (2008).
  • [10] S. Nomura and H. Toyota, Appl. Phys. Lett. 83, 4503 (2003).
  • [11] T. Ishijima, H. Hotta, H. Sugai and M. Sato, Appl. Phys. Lett. 91, 121501 (2007).
  • [12] V.A. Ryzhkov, Physica B 323, 324 (2002).
  • [13] T. Tomai, K. Katahira, H. Kubo, Y. Shimizu, T. Sasaki, N. Koshizaki and K. Terashima, J. Supercritical Fluids 41, 404 (2007).
  • [14] K. Baba, T. Kaneko and R. Hatakeyama, Jpn. J. Appl. Phys. 45, 8286 (2006).
  • [15] K. Baba, T. Okada, T. Kaneko, R. Hatakeyama and H. Yoshiki, Thin Solid Films 515, 4308 (2007).
  • [16] K. Baba, T. Kaneko and R. Hatakeyama, Appl. Phys. Lett. 90, 201501 (2007).
  • [17] S.A. Meiss, M. Rohnke, L. Kienle, S. Zein El Abedin, F. Endres and J. Janek, ChemPhysChem 8, 50 (2007).
  • [18] T. Torimoto, K. Okazaki, T. Kiyama, K. Hirahara, N. Tanaka and S. Kuwabata, Appl. Phys. Lett. 89, 243117 (2006).
  • [19] T. Okada, T. Kaneko, R. Hatakeyama and K. Tohji, Chem. Phys. Lett. 417, 288 (2006).
  • [20] T. Kaneko, T. Okada and R. Hatakeyama, Contrib. Plasma Phys. 47, 57 (2007).
  • [21] K.R. Seddon, Nature Mater. 2, 363 (2003).
  • [22] R.D. Rogers and K.R. Seddon, Science 302, 792 (2003).
  • [23] E. Sloutskin, B.M. Ocko, L. Tamam, I. Kuzmenko, T. Gog and M. Deutsch, J. Am. Chem. Soc. 127, 7796 (2005).
  • [24] K.-H. Yoo, D.H. Ha, J.-O. Lee, J.W. Park, J. Kim, J.J. Kim, H.-Y. Lee, T. Kawai and H.-Y. Choi, Phys. Rev. Lett. 87, 198102 (2001).
  • [25] D. Kato, N. Sekioka, A. Ueda, R. Kurita, S. Hirono, K. Suzuki and O. Niwa, J. Am. Chem. Soc. 130, 3716 (2008).
  • [26] R. Hatakeyama, T. Hirata and G.-H. Jeong, Plasma Source Sci. Technol. 13, 108 (2004).
  • [27] P. Debye and E. Huckel, Physikalische Zeitschrift 24, 185 (1923).
  • [28] M. Washizu and O. Kurosawa, IEEE Trans. Ind. Appl. 26, 1165 (1990).
  • [29] R. Krupke, F. Hennrich, H.B. Weber, M.M. Kappes and H.v. Lohneysen, Nano Lett. 3, 1019 (2003).
  • [30] T. Izumida, R. Hatakeyama, Y. Neo, H. Mimura, K. Omote and Y. Kasama, Appl. Phys. Lett. 89, 093121 (2006).

This paper may be cited as follows:

Toshiro KANEKO, Kazuhiko BABA and Rikizo HATAKEYAMA, Plasma Fusion Res. 4, 028 (2009).