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Development of Tin Droplet Target for 13.5 nm Lithography

Etsuo FUJIWARA, Hiroki SUGISHITA, Yasuhiro OKABE, Mitsuyasu YATSUZUKA and Hiroaki NISHIMURA¹⁾

Department of Electrical Engineering and Computer Sciences, University of Hyogo

1)

Institute of Laser Engineering, Osaka University

(Received 3 September 2006 / Accepted 25 September 2006 / Published 7 December 2006)

Abstract

A new flow control method for a tin droplet generator in a vacuum has been developed for Extreme Ultra-Violet Lithography. A vibration rod forced by a piezoelectric crystal varies the flow resistance, thus changing the flow rate at a high repetition rate. This droplet generator is advantageous for high temperature liquids such as molten metal. The formation of tin droplets using this generator was demonstrated at a frequency range of 10 kHz to 22 kHz by a 100 m nozzle.

Copyright (c) 2006 The Japan Society of Plasma Science and Nuclear Fusion Research

Keywords

tin droplet, droplet generator, EUV, lithography

DOI: 10.1585/pfr.1.055

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References

• [1] M.J. McCarthy and N.A. Molloy, Chem. Engin. 7, 1 (1974).
• [2] H.M. Hertz et al. Proc. SPIE 2523, 88 (1995).
• [3] RE. Phinney, AIChE J. 18, 432 (1972).
• [4] G. Magnus, Ann. Phys. Chem. 95, 1 (1855).
• [5] T.W. Shield, D.B. Bogy and F.E. Talke, IBM J. Res. Dev. 31, 96 (1987).
• [6] Japan Patent Application No.2005-336714.
• [7] J.M. Schneider and C.D. Hendlick, Rev. Sci. Instrum. 35, 1349 (1964).

This paper may be cited as follows:

Etsuo FUJIWARA, Hiroki SUGISHITA, Yasuhiro OKABE, Mitsuyasu YATSUZUKA and Hiroaki NISHIMURA, Plasma Fusion Res. 1, 055 (2006).