Plasma and Fusion Research
Volume 5, S2020 (2010)
Regular Articles
- National Institute for Fusion Science, Oroshi-cho 322-6, Toki 509-5292, Japan
- 1)
- Research Center for Computational Science, Institute for Molecular Science, 38 Nishigo-Naka, Myodaiji, Okazaki 444-8585, Japan
- 2)
- Department of Energy Engineering and Science, Graduate school of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-01, Japan
Abstract
Chemical sputtering on a graphite (0 0 0 1) surface due to hydrogen atom bombardment was investigated by a molecular dynamics simulation. To understand the temperature dependence of the sputtering yield of CHx and C2Hx, two thermostat methods used to control material temperature, the Langevin and Berendsen thermostats, were compared. The simulated sputtering yield of CH4 with a peak at 600 K under the Langevin thermostat agreed with experimental observations. The present simulation showed that the sputtering yield depends on the thermal relaxation time, which is the time required for the temperature to reduce and is the second key parameter for both thermostat methods. In addition, it was demonstrated that the Berendsen thermostat, which controls temperature globally, provides larger sputtering yields of CHx and C2Hy than the Langevin thermostat, which controls temperature locally.
Keywords
molecular dynamics, plasma-wall interaction, chemical sputtering, graphite, carbon
Full Text
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This paper may be cited as follows:
Atsushi M. ITO, Hisashi OKUMURA, Seiki SAITO and Hiroaki NAKAMURA, Plasma Fusion Res. 5, S2020 (2010).