Plasma and Fusion Research
Volume 3, 001 (2008)
Rapid Communications
- 1)
- Nuclear Fusion Institute, RRC Kurchatov Institute, 123182, Kurchatov Sq.1, Moscow, Russia
- 2)
- National Institute for Fusion Science, Oroshi 322-6, Toki, Gifu 509-5292, Japan
Abstract
We consider a sheath region bounded by a corrugated surface of material conductor and a flat boundary held to a constant voltage bias. The real profile of the film deposited from plasma on a limiter in a fusion device was used in numerical solving of the Poisson's equation to find a profile of electrostatic potential. The rough surface influences the equipotential lines over the surface. We characterized a shape of equipotential lines by a fractal dimension. The long-range correlation in the potential field is imposed by the non-trivial fractal structure of the surface. Dust particles bounced in such irregular potential field can accelerate due to the Fermi acceleration.
Keywords
plasma-surface interaction, sheath layer, dust motion, fractal boundary, deposited film, fusion device, Fermi acceleration
Full Text
References
- [1] V.P. Budaev, Physica A 382, 359 (2007).
- [2] S. Krasheninnikov et al., Phys. Plasmas 11, 3141 (2004).
- [3] C.J.G. Evertszt and B. Mandelbrot, J. Phys. A Math. Gen. 21, 1781 (1992).
- [4] B. Sapoval, Phys. Rev. Lett. 73, 3314 (1994).
- [5] H. de O. Dias Filho et al., Physica A 342, 388 (2004).
- [6] M. Lieberman and A. Lichtenberg, Principles of plasma discharges and materials processing (John Wiley & Sons, New York, 1994).
- [7] O.C. Zienkiewicz and R.L. Taylor, The Finite Element Method, Vol. 1 - 3 (Butterworth-Heinemann, Oxford, 2000).
- [8] Partial Differential Equation Toolbox User's Guide: For Use with MATLAB (The MathWorks, Inc., 1997).
- [9] A. Loskutov and A. Ryabov, J. Stat. Phys. 108, 995 (2002).
This paper may be cited as follows:
Viacheslav Petrovich BUDAEV and Mikhail YAKOVLEV, Plasma Fusion Res. 3, 001 (2008).