Plasma and Fusion Research

Volume 17, 1206031 (2022)

Rapid Communications

Low-Temperature Deposition of Diamond-like Carbon Films Using a Repetitive Nanosecond Pulsed Glow Discharge Plasma Operated in Burst Mode
Takuma MINE, Ryohei MASAI, Mizuki KAWAGUCHI1) and Yusuke KIKUCHI
Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan
1)
School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan
(Received 29 December 2021 / Accepted 6 February 2022 / Published 30 March 2022)

Abstract

A diamond-like carbon film with a film hardness of 12 GPa was prepared at a low substrate temperature of 60℃ using a repetitive nanosecond pulsed glow hydrogen/methane discharge plasma operated in burst mode under a gas pressure of 1.2 kPa. As the peak electrical power of the pulsed discharge increased, the hydrogen content in the films estimated by Raman spectroscopy decreased and the film hardness increased. The ion irradiation to the substrate is considered to be the main factor determining the film properties, since the hydrogen abstraction reaction and the etching of graphite components by hydrogen radical irradiation are weakened in the low-temperature deposition.

Keywords

diamond-like carbon, nanosecond pulsed glow discharge, burst operation

DOI: 10.1585/pfr.17.1206031

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