Plasma and Fusion Research

Volume 16, 1406046 (2021)

Regular Articles

Spatial Uniformity Evaluation of Atmospheric-Pressure Microwave Line Plasma for Wide-Area Surface Treatment
Haruka SUZUKI1,2), Hirotsugu KOMA1), Tomohiro OGASAWARA1), Yosuke KOIKE1) and Hirotaka Toyoda1,2,3)
1)
Department of Electronics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
2)
Center for Low-temperature Plasma Sciences, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
3)
National Institute for Fusion Science, 322-6 Oroshi, Toki 509-5292, Japan
(Received 17 October 2020 / Accepted 13 February 2021 / Published 9 April 2021)

Abstract

Spatial uniformity of an atmospheric-pressure microwave line plasma is evaluated from surface hydrophilicity treatment of polyethylene terephthalate film as well as observation of optical emission from the plasma. Prior to the experiments, the structure of the waveguide-based plasma source is optimized using a three-dimensional electromagnetic simulation to suppress standing-wave generation for the uniformity of plasma production. The spatial distribution in the longitudinal direction of the Argon (Ar) plasma is investigated by operating the microscope parallel to the slot and by irradiating film with the plasma to improve surface wettability of the film. Uniform profile of water contact angle is obtained in 40 cm with very high-speed processing.

Keywords

atmospheric pressure plasma, microwave plasma, hydrophilic treatment of film

DOI: 10.1585/pfr.16.1406046

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