[Table of Contents]

Plasma and Fusion Research

Volume 7, 2405134 (2012)

Regular Articles

Deuterium Retention and Desorption Behavior of Co-Deposited Carbon Film Produced in Gap
Yuji NOBUTA, Kenji YOKOYAMA1), Jun KANAZAWA, Yuji YAMAUCHI, Tomoaki HINO, Satoshi SUZUKI1), Koichiro EZATO1), Mikio ENOEDA1) and Masato AKIBA1)
Laboratory of Plasma Physics and Engineering, Hokkaido University, Sapporo 060-8628, Japan
Japan Atomic Energy Agency, 801-1 Mukouyama, Naka-shi, Ibaraki 311-0193, Japan
(Received 8 December 2011 / Accepted 3 August 2012 / Published 15 October 2012)


Co-deposition of deuterium with carbon in an opening on a plasma-facing surface, a so-called ‘gap', was simulated by using a deuterium arc discharge with carbon electrodes. The carbon deposition distribution and deuterium retention/desorption behavior of the carbon film were investigated. The amount of deposited carbon decreased exponentially with an increase of the distance from the gap entrance and more rapidly decreased with an increase in discharge gas pressure. The deuterium concentration in the carbon film increased with discharge gas pressure. At a high discharge gas pressure of 36 Pa, the atomic ratio of D/C in the carbon film reached as high as 0.9. Deuterium retained in the film desorbed mainly in the forms of D2, HD, CD4 and C2D4. The desorption behavior of retained deuterium depended on D/C. In a film with a high D/C ratio, desorption of D2 started at lower temperatures. The amount of desorbed hydrocarbons (CD4 and C2D4) increased with D/C. Carbon film with high D/C tended to contain a polymer-like structure, which could be related to the desorption behavior of the retained deuterium.


tritium retention, co-deposition, carbon film, thermal desorption, gap

DOI: 10.1585/pfr.7.2405134


  • [1] G. Federici et al., Nucl. Fusion 41, 1967 (2001).
  • [2] I. Tanarro et al., J. Nucl Mater. 390-391, 696 (2009).
  • [3] C. Hopf et al., J. Nucl. Mater. 363-365, 882 (2007).
  • [4] T.S. Selinger et al., J. Nucl. Mater. 390-391, 602 (2009).
  • [5] M. Nieuwenhuizen et al., Philips Tech. Rev. 27, 87 (1966).
  • [6] R. Messier et al., J. Vac. Sci. Technol. A18, 1538 (2000).
  • [7] R.N. Tait et al., Thin Solid Films 226, 196 (1993).
  • [8] K. Niwase et al., J. Nucl. Mater. 191-194, 335 (1992).
  • [9] M. Yoshida et al., J. Nucl. Mater. 386-388, 841 (2009).
  • [10] C. Casiraghi et al., Diamond Relat. Mater. 4, 1098 (2005).
  • [11] J. Likonen et al., J. Nucl. Mater. 337, 486 (2008).
  • [12] B. Marchon et al., IEEE Trans. Magn. 33, 3148 (1997).
  • [13] V. Kh. Alimov, Phys. Scr. T108, 46 (2004).

This paper may be cited as follows:

Yuji NOBUTA, Kenji YOKOYAMA, Jun KANAZAWA, Yuji YAMAUCHI, Tomoaki HINO, Satoshi SUZUKI, Koichiro EZATO, Mikio ENOEDA and Masato AKIBA, Plasma Fusion Res. 7, 2405134 (2012).