Plasma and Fusion Research
Volume 6, 1306155 (2011)
Letters
- Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
- 1)
- FIRST Research Center for Innovative Nanobiodevice, Nagoya University, Furo-cho, Chikusa, Nagoya, Aichi 464-8603, Japan
- 2)
- Division of Neuroscience, Department of Developmental Biology and Neurosciences, Tohoku University, 2-1-1 Katahira, Aoba, Sendai, Miyagi 980-8577, Japan
Abstract
It is shown that neuronal model cells PC12 (rat adrenal pheochromocytoma cell line) can be cultured on a silicon (Si) substrate with the use of extracellular matrix (ECM) patterned by atmospheric-pressure plasmas (APPs). Arrangement of neuron cells in a desired pattern on a Si chip is an important step for the development of neuron cell chips. In the experiments, 100-200 µm wide strips of ECM (Poly-L-Lysine) layers arranged in parallel were formed on a 1 cm2 area of a Si surface by the APP etching technique and PC12 cells were shown to grow on the ECM strips. The APP etching technique for ECM layers provides a simple mean of arranging neuron cells on a relatively large area of a Si surface.
Keywords
atmospheric pressure plasma, extracellular matrix, patterning, plasma etching, PC12 cell, cell adhesion
Full Text
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This paper may be cited as follows:
Ayumi ANDO, Hidetaka UNO, Toshifumi ASANO, Tsuneo URISU and Satoshi HAMAGUCHI, Plasma Fusion Res. 6, 1306155 (2011).