Plasma and Fusion Research
Volume 1, 055 (2006)
Rapid Communications
- Department of Electrical Engineering and Computer Sciences, University of Hyogo
- 1)
- Institute of Laser Engineering, Osaka University
Abstract
A new flow control method for a tin droplet generator in a vacuum has been developed for Extreme Ultra-Violet Lithography. A vibration rod forced by a piezoelectric crystal varies the flow resistance, thus changing the flow rate at a high repetition rate. This droplet generator is advantageous for high temperature liquids such as molten metal. The formation of tin droplets using this generator was demonstrated at a frequency range of 10 kHz to 22 kHz by a 100 m nozzle.
Keywords
tin droplet, droplet generator, EUV, lithography
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This paper may be cited as follows:
Etsuo FUJIWARA, Hiroki SUGISHITA, Yasuhiro OKABE, Mitsuyasu YATSUZUKA and Hiroaki NISHIMURA, Plasma Fusion Res. 1, 055 (2006).