IZAWA Masaru
Hitachi High-Technologies Corp
Challenges of Atomic Level Control in Plasma Processing for LSI Device Fabrication
★Nov. 21(Tue.) 9:45〜10:45
Challenges of Atomic Level Control in Plasma Processing for LSI Device Fabrication
★Nov. 21(Tue.) 9:45〜10:45
Laboratory Plasma Astrophysics in the Big Red Plasma Ballk
★Nov. 21(Tue.) 11:00〜12:00
Advanced Helical Plasma Research Being Evolved by Deuterium Experiment in Large Helical Device
★Nov. 23(Thu.) 11:45〜12:45
Hemostasis using low-temperature plasma treatment
-To develop a novel technology for processing tissue, cells and biomaterials-
★Nov. 24(Fri.) 11:45〜12:45-